Thin film coating materials CuMnNi sputtering target 

 

     

Features

Chemical Composition: copper manganese nickel target

Available Purity: 3N

Production Technology: Powder Metallurgy

Shapes: planar targets

Available size: round target, diameter ≤ 14", rectangle target, according to your requirement,

Indium bonding is recommended for this materials

Advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.

Company Profile:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

  OUR PRODUCTS                            
   


 OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm
 PRODUCTION PROCESS