Zirconium Sputtering Target

Application: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.

Physical and Chemical Properties
Chemical Composition: Zr
Molding process: One batch formed
Purity:   ≥6.4g/cm3(≥ 98%)
Density:   ≥ 99.5%

Machining Size
Customized according to customer requirements